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Fig. 3 | Advanced Structural and Chemical Imaging

Fig. 3

From: Deceleration of probe beam by stage bias potential improves resolution of serial block-face scanning electron microscopic images

Fig. 3

Monte Carlo simulation of electron–beam interaction in a carbon substrate. a Penetration depth of a 1.5-keV electron beam. b Line scan of a BSE signal profile for the 1.5-keV electron beam. c Penetration depth of a 3-keV electron beam. d Line scan of a BSE signal profile for the 3-keV electron beam. The simulations in a and c were performed for 10,000 electrons, with the electrons emerging as BSE shown in a darker shade. The simulations in b and d were performed at a pixel size of 1 nm for 1 million electrons. An infinitesimally thin-electron beam was assumed in all the simulations

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